1. Structure of PN Junction Diode
A PN junction diode consists of two types of semiconductor materials:
(A) P-Type Semiconductor:
Doped with trivalent elements like Boron (B), Gallium (Ga), or Indium (In).
Contains holes (positive charge carriers) as the majority carriers and electrons as the minority carriers.
(B) N-Type Semiconductor:
Doped with pentavalent elements like Phosphorus (P), Arsenic (As), or Antimony (Sb).
Contains electrons (negative charge carriers) as the majority carriers and holes as the minority carriers.
(C) Depletion Region:
When the P-type and N-type materials are joined, electrons from the N-region diffuse into the P-region and recombine with holes, forming a depletion region near the junction. This region:
Contains immobile ions (positive ions in the N-region and negative ions in the P-region).
Acts as a potential barrier that prevents further charge carrier movement.
Has an inbuilt potential (typically 0.7V for silicon diodes and 0.3V for germanium diodes).
2. Biasing of PN Junction Diode
The behavior of a PN junction diode depends on how voltage is applied across it.
(A) Forward Bias Condition:
Positive terminal of the battery is connected to the P-region, and the negative terminal is connected to the N-region.
This reduces the depletion width, and the potential barrier decreases.
Once the applied voltage exceeds the barrier potential (0.7V for Si, 0.3V for Ge), the diode conducts current exponentially.
The current follows the diode equation: